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October 2023

Card - Nanoimprint lithography system
Nanoimprint Lithography Semiconductor Manufacturing System that Covers Diverse Applications with Simple Patterning Mechanism

31 Oct 2023 — Canon announced today the launch of the FPA-1200NZ2C nanoimprint semiconductor manufacturing equipment, which executes circuit pattern transfer, the most important ...

Industrial Equipment

March 2023

Canon Introduces a New Lithography System with Large Exposure Field at a High Resolution for Producing Full-frame CMOS Sensors, XR devices and Others_570x400
Canon Introduces a New Lithography System with Large Exposure Field at a High Resolution for Producing Full-frame CMOS Sensors, XR devices and Others

13 Mar 2023 — Canon announced today that the company will release the FPA-5550iX i-line stepper semiconductor lithography system for front-end processes that realizes a large ...

Industrial Equipment

December 2022

Canon Announces the PD-710 Device that Realizes High-precision Non-contact Measurement of Target Object Displacement and Speed on Manufacturing Lines and Featuring New Optical System that Greatly Increases Measurement Range
Canon Announces the PD-710 Device that Realizes High-precision Non-contact Measurement of Target Object Displacement and Speed on Manufacturing Lines and Featuring New Optical System that Greatly Increases Measurement Range

20 Dec 2022 — Canon announced today the launch in Japan of a new measurement device for making high-precision measurements of components, parts and other objects on manufacturing ...

Industrial Equipment
image-pr-csra-1321
New Canon Option for Semiconductor Lithography System Back-end Process Contributes to 3D Advanced Packaging Technologies, Enables Mass Production of Dense Circuitry with Exposure Fields of Up to 100 mm x 100 mm

06 Dec 2022 — Canon Inc. announced today the launch in Japan of the FPA-5520iV LF2 Option for back-end process semiconductor lithography i-line stepper systems that contributes ...

Industrial Equipment

September 2022

Canon Announces “Lithography Plus” Solution Platform Offering Canon’s Support Know-how to Help Maximize Productivity for Semiconductor Lithography Systems
Canon Announces “Lithography Plus” Solution Platform Offering Canon’s Support Know-how to Help Maximize Productivity for Semiconductor Lithography Systems

05 Sep 2022 — Canon Inc. announced that the company will today begin offering the “Lithography Plus,” solution platform for semiconductor lithography systems.

Industrial Equipment

July 2022

Canon Commences Sales of FPD Lithography Equipment that Achieves ±1.5 µm Resolution with An Overlay Accuracy of ±0.35 µm for Generation 8 Glass Panels
Canon Commences Sales of FPD Lithography Equipment that Achieves ±1.5 µm Resolution with An Overlay Accuracy of ±0.35 µm for Generation 8 Glass Panels

27 Jul 2022 — Canon Inc. announced today that the company has commenced sales of the MPAsp-H1003H, a new Flat Panel Display (FPD) lithography system that is capable of resolving ...

Industrial Equipment

June 2022

FPA-6300ES6a
Canon Commences Sales of A New ‘Grade 10’ Productivity Upgrade Option for FPA-6300ES6a KrF Scanners that Realizes Industry-leading High-productivity Standard of 300 WPH

13 Jun 2022 — Canon Inc. announced today that the company has commenced sales of a new “Grade 10” productivity upgrade option for its FPA-6300ES6a KrF semiconductor lithography ...

Industrial Equipment
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