A lineup of Semiconductor Lithography Equipment designed to meet the technical requirements of a wide range of applications in addition to traditional semiconductor wafer processing.
A lineup of Lithography Equipment for array process, colour filter process and touch panel process and continues to support MPAsp series Flat Panel Display equipment by developing new functions & panel exposure productivity improvements.
Sputtering equipment that supports mass production and next generation development of magnetic disks.
Vacuum application products, such as sputtering equipment, etching equipment, bonding equipment, and annealing equipment.
Ultra-high vacuum in-situ processes of wafer transfer, film deposition, bonding and bonded wafer collection with automatic operation.
Measure the velocity and length without contacting moving target to prevent staining and damaging with high-speed up to 100 G of acceleration and features a depth detection range of ±15 mm.
Canon Anelva vacuum components are essential for thin film manufacturing, widely utilized across various industries and research laboratories for their reliability and performance.
